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Leica DM3 XL Leica Microsystems

Leica DM3 XL

Production of semi-conductors

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Speed matters in inspection, process control, or defect and failure analysis for the microelectronics and semiconductor industry. The faster you detect a defect, the faster you can react. With a large field of view, the DM3 XL inspection system allows your team to identify defects faster and increase your yield rate. Make use of the 30% increased field of view of the unique macro objective. Additionally, the DM3 XL uses LED illumination for all contrast methods. LED illumination provides a constant color temperature and offers real color imaging at all intensity levels. - Increase your yield - Reliably detect insufficient development at the edge or within the center of a wafer - Detect uneven radial film thickness - True-to-life color imaging at all intensity levels - Reproducible results

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